Engineering surfaces through sequential stop-flow photopatterning

Solution-exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet-printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.

Pester, C.W., Narupai, B., Mattson, K.M., Bothman, D.P., Klinger, D., Lee, K.W., Discekici, E.H. and Hawker, C.J.
Advance Materials
Volume: 28
Number: 42
Pages: 9292–9300
Date: November, 2016
ICB Affiliated Authors: Craig J Hawker