Strain relaxation of InGaN/GaN multi-quantum well light emitters via nanopatterning

Abstract

Strain in InGaN/GaN multiple-quantum well (MQW) light emitters was relaxed via nanopatterning using colloidal lithography and top-down plasma etching. Colloidal lithography was performed using Langmuir-Blodgett dip-coating of samples with silica particles (d = 170, 310, 690, 960 nm) and a Cl2/N2 inductively coupled plasma etch to produce nanorod structures. The InGaN/GaN MQW nanorods were characterized using X-ray diffraction (XRD) reciprocal space mapping to quantify the degree of relaxation. A peak relaxation of 32% was achieved for the smallest diameter features tested (120 nm after etching). Power-dependent photoluminescence at 13 K showed blue-shifted quantum well emission upon relaxation, which is attributed to reduction of the inherent piezoelectric field in the III-nitrides. Poisson-Schrödinger simulations of single well structures also predicted increasing spectral blueshift with strain relaxation, in agreement with experiments.

ICB Affiliated Authors

Authors
Ryan Ley, Lesley Chan, Pavel Shapturenka, Matthew Wong, Steven DenBaars, and Michael Gordon
Date
Type
Peer-Reviewed Article
Journal
Optics Express
Volume
27
Number
21
Pages
30081-30089
Emblems